Installation and model shots Genetic City DCC Shanghai Expo

Uploaded by neville mars / 7.0 years ago / 4965 hits / 3.08 MB

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Image EXIF

  • Aperture: f/2.0
  • Exposure: 0.033333 sec (10/300)
  • Focal length: 5.1 mm
  • Focal length 35mm equiv: 24 mm
  • ISO speed: 500
  • Exposure bias: 0 EV
  • Exposure program: Normal program
  • Metering mode: Pattern
  • Flash: Flash did not fire, compulsory flash mode
  • Orientation: Horizontal
  • Resolution: 180 x 180
  • Dimensions: 3781 x 2127 pixels
  • Compressed bits per pixel: 4 bits
  • Camera: DMC-LX3
  • Software: Adobe Photoshop CS3 Macintosh
  • Modified date: 30 Aug 2010 17:55
  • Capture date: 24 Aug 2010 06:41